Location: Fab10N Singapore

Department: Process Development – Singapore (Photolithography)

Project title: Edge Placement Error Modeling and Optimization

Project Description: Develop and optimize models for overlay and critical dimension uniformity improvement. Project scope: Introduction to photolithography for semiconductor patterning and control.

• Develop and deploy edge placement error model for photolithography

• Mathematical modeling and numerical analysis with programming knowledge (preferred)
• Characterization techniques: SEM, optical imaging

• Semiconductor Manufacturing
• Nanomaterials
• Physics
• Mathematical modeling
• Programming

4-6 months (minimum 4 months)

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